The insulation used for a high voltage application is one of the most important components in any design because breakdown of the insulation may cause total failure of the whole component. The electrical insulation system is subjected to high electrical, mechanical and thermal stresses which can age and degrade the insulation to the point where partial discharges (PD) can become a regular occurrence ultimately leading to total breakdown. Detection and analysis of PD activity is therefore important to ensure the health and lifetime of any high voltage asset.
Partial discharge is a discharge event that does not bridge the electrodes within an electrical insulation system under high voltage stress. In high voltage components, the measurement of partial discharge is used in the performance assessment of an insulation system. Through modelling and measuring the discharge process a better understanding of the phenomena may be attained. This project describes the development of a mathematical model describing partial discharge in a spherical cavity and ellipsoidal cavity within a homogeneous dielectric. The model developed is used to study the influence of the applied frequency on partial discharge activity and also the influence of the cavity size and cavity location within the insulation material on partial discharge frequency dependent activity. The simulation results can then be used within insulation diagnostics to assist in the assessment of the performance of the insulation system.
A number of technical and policy issues are of concern within the University around e-assessment, including:
The University has received funding to accelerate the process of both implementing an open source, service based solution to institutional e-assessment and addressing institutional change by engaging academics and students in co-design and co-deployment. In line with the recently introduced University e-Learning Enhancement Strategy, which places the quality of student learning as its first objective, the EASiHE project intends to provide an open source solution for formative assessment by integrating services currently available within the JISC eFramework.
The project will:
The main deliverables include:
As partners in the JISC Institutional Innovation Support Project, EASiHE will be actively involved in producing briefing materials and training activities for exemplary practice.
The aim of this research is to beneficially redistribute energy consumption in wireless sensor networks. Typically, sensor nodes have scarce energy resources and must rely on energy harvesting to prolong their life. By contrast, the sink node is often integrated into a higher-level system and can benefit from the accompanying plentiful energy resources, such as the mains. It is therefore desirable to redistribute energy consumption from the sensor nodes to the sink node. This can be achieved using iterative decoding.
This project is investigating the development and demonstration of a pervasive home welfare monitoring system. The system aims to use unobtrusive sensors for early detection and automated reporting of deteriorating physiological health parameters and enabling independent living.
To develop algorithms and protocols that can improve the scalability of sensor networks by using cluster-based routing mechanisms. The network must be able to balance energy consumption between nodes and maintain message latency under predetermined values.
The group intends to develop a Long-term Patient Monitoring Research Platform to support and assist health-care providers. The Research platform, which does not intend to rely on a central server or a continuously connected Internet connection, aims to act as a low-cost support tool to aid health-care providers of the future.
The continued scaling of MOSFETs to the deca-nanometre regime has reached the point where the transistor size is now comparable with the grain size in a polysilicon film (typically 100-200nm). The time is therefore right to research processing techniques that would allow a transistor to be fabricated inside a grain of polysilicon. Such transistors would be expected to have significantly better performance than thin film transistors (TFTs) because grain boundaries would be eliminated from the channel region. The transistor performance might also approach that achievable in single-crystal silicon if good control could be obtained over the quality of the silicon inside the polysilicon grain. The applications for transistor-in-a-grain technology would potentially be enormous, and would include high-performance large area electronics, displays and any technology where low temperature processing was required. In the longer term, this technology may also be attractive for post-scaling CMOS, since it would enable 3D CMOS technologies to be implemented.
Layers of polycrystalline silicon self-assemble during growth and hence the positions of the grains and grain boundaries are random. The key issue in researching transistor-in-a-grain technology is therefore to devise processing techniques that allow the polysilicon grains to be precisely located with respect to the position of the transistor. This thesis investigates grain localization techniques and transistor architectures for transistor-in-grain technology. Two novel methods of low temperature crystallization of amorphous silicon are researched to increase the grain size and controlling the grain boundary locations. One method uses fluorine during metal induced lateral crystallization (MILC) of ñ-Si, which suppresses random grain nucleation during crystallization anneal and increases the laterally crystallized distance. Fluorine implantation also significantly reduces the density of the nickel-silicide precipitates and improves the grain texture in the laterally crystallized silicon. Another method employs germanium seed where a new amorphous silicon crystallization phenomenon has been identified to originate from the perimeter of the germanium seed during low temperature anneal and grain localization is achieved without any metal contamination. These methods of devising high quality poly-silicon layer have considerable commercial potential for a number of devices like thin film transistors for large area electronics, transistor-in-grain for 3D CMOS, thin film solar cells, sensor applications in a cost effective thin film based nanowire technology and any devices where low temperature processing is required.
This research aims to investigate the use of CMOS-compatible vertical MOSFETs for the implementation of medium-power RF circuits, opening the way to higher integration of RF systems. Vertical transistors are currently of interest because they offer an alternative route to ultra-short channel MOS transistors with relaxed lithography requirements (and hence considerably lower costs), decouple gate length from the packing density and provide improved current drive per unit silicon area compared with conventional lateral CMOS. In this research approaches will be investigated that deliver these benefits through the integration of vertical MOSFETs in a mature CMOS technology with minimum additional masks above those required for standard 0.5 micron CMOS. The intention is to appraise in depth, the feasibility of this novel technology for the manufacture of low-cost RF solutions.
The challenges of vertical MOSFETs for RF applications are high overlap capacitance, short channel effects, susceptibility to dry etch damage and the lack of an appropriate silicidation technology. A detail investigation has been done to deliver solutions for challenges like overlap capacitance, short channel effects and dry etch damage. CMOS compatible Fillet Local Oxidation (FILOX) process, novel structures (frame gate) and optimised process have been researched to reduce the overlap capacitance and to eliminate dry etch damage associated device degradation. The resulting transistors are found to have significantly improved immunity to short channel effects, with near ideal sub-threshold slopes of 70 to 80 mV/decade, and DIBL of 30 to 35 mV/V. Most recently we have developed for the first time a silicidation technology for surround gate vertical MOSFETs. The technology uses a double spacer comprising a polysilicon spacer for the surround gate and a nitride spacer for the silicidation. For a 120 nm channel length, silicided frame gate vertical nMOSFETs show a 30% improvement in the drive current with an excellent sub-threshold slope of 78mV/decade and a DIBL of 30 mV/V. For an 80 nm channel length, a 43% improvement in the drive current is obtained. Vertical transistors with our FILOX process and silicidation resulted in a transistor with low overlap capacitance and high transistor transconductance. While conventional planar nMOS devices exhibit a fT of 10 GHZ in a 0.5 micron technology node, our vertical nMOS devices fabricated by above mentioned FILOX and silicidation process demonstrating a fT of 20 GHZ in the same technology node. We are currently investigating several RF circuits with verical nMOS devices aimed at the highly lucrative 1-10 GHz market.
One of the directions that Wireless Sensor Networks are considered to play an important role, is in motion detection and target tracking systems. This research focuses on employing l ow-cost,low-power, limited sized devices, for detection and tracking of mobile targets. Novel tracking algorithms and information processing techniques are investigated to improve performance. This project aims at developing a system capable of handling multiple targets moving arbitrarily in the networks coverage area.
To develop and demonstrate an integrated approach to power management such that sensors within a sensor network are able to manage their energy requirements, and harvest energy from the local environment, whilst simultaneously coordinating their activities in order to achieve system-wide aggregate goals.